EQU-19919 - USA (Ruston, Louisiana) - An Electron Beam Lithography System - Deadline October 9,2026

Vendor needs to provide an electron beam lithography system to the government authority located in Ruston, LA. – Electron beam lithography (EBL) nano patterning shall be able to reach a resolution.– Site license shall be available for EBL software to enable installation on Windows–based computers to off–site prepare pattern design data files prior to instrument usage, or for usage of design files of industry standard file formats from third–party CAD softwares.– The entire vacuum system of the instrument shall be completely oil–free. – The EBL system shall include fully integrated imaging capabilities.– The system shall include all operating and / or technical manuals and the manufacturer offers telephone, e–mail, and remote system support during the normal business hours of the University.